Hayashi Pure Chemical Ind., Ltd.


Product Description

Developers & Strippers

Resist Stripper (Amine/Solvent-based, Solvent-based, Organic-Alkali-based) Pure Clean MC series

This series includes strippers containing a combination of amine and solvent as well as solvent-based and organic alkali-based strippers.

Keywords: resist, non-water-based


  • Excellent resist removal without chemical damage on metal film and insulating film
  • Using from low temperature to high temperature
  • All resist stripping solutions do not contain NMP